In the world of semiconductor fabrication, consistency, reliability and yield are critical at every part of the process. For over 25 years, 3M™ CMP Pad Conditioners have provided innovative pad conditioning solutions to some of the world’s leading semiconductor fabricators.
From the exclusive sintered abrasive diamond technology behind 3M™ Diamond Pad Conditioners to the precisely microreplicated patterns in 3M™ Trizact™ Pad Conditioners, our global technical team is committed to continually redefining the cutting edge of CMP polishing pad conditioner technology. Research and manufacturing facilities around the world provide convenient product support and product supplies.
3M™ Trizact™ Pad Conditioners
3M™ Diamond Pad Conditioners
3M™ CMP Pad Conditioner Brushes
Please provide your contact information and our team will get back to you with the latest version of our 3M™ CMP Pad Conditioner Product Selection Guide, including a detailed breakdown of all 3M’s CMP solutions, from our broad range of trusted 3M™ Diamond Pad Conditioners to the latest 3M™ Trizact Pad Conditioner T Series products and more.
An error has occurred while submitting. Please try again later.
Your form was submitted successfully and a member of our team will be in touch shortly.
Our pad conditioners work with many common combinations of pad hardness and density. See what works best for you, or let our technical team test a custom specification.
The T Series enhances the conventional 3M™ Trizact™ pad conditioner platform with a surface topography optimized for stronger pad activation, slower pad wear rate decay and even more consistent performance.
The C Series brings extra-precise diamond placement at the micrometer scale to further help control co-planarity and flatness for even more consistent performance in CMP pad conditioning.
Factory-applied to any 3M™ Diamond Pad Conditioner, 3M™ Diamond Pad Conditioner C Series, 3M™ Trizact™ Pad Conditioner or 3M™ Trizact™ Pad Conditioner T Series, these advanced coatings help limit defectivity from wafer scratching. In testing, they substantially reduced metal leaching by up to 75% compared to legacy disks.
An error has occurred while submitting. Please try again later...
Your form was submitted successfully