3M™ CMP Pad Conditioner Brush

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Excellent for soft CMP pads, including microreplicated, porometric and felt-based pads

Efficient pad cleaning and slurry distribution helps manufacturers enable low cost of ownership

Metal-free, polymer bristles resist corrosion

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Excellent for soft CMP pads, including microreplicated, porometric and felt-based pads
Efficient pad cleaning and slurry distribution helps manufacturers enable low cost of ownership
Metal-free, polymer bristles resist corrosion
Durable bristles are independently fixed across the brush surface
3M™ CMP brush connects easily to polishing tool end effector
Designed for semiconductor grade CMP processes

Engineered specifically for chemical mechanical polishing (CMP) pad cleaning applications, our 3M™ CMP Pad Conditioner Brush is excellent for efficient pad cleaning and slurry distribution which helps manufacturers reduce cost of ownership in semiconductor operations. These 3M CMP brushes are part of a full range of 3M CMP solutions.

Excellent for use with soft CMP pads

Strong, durable bristles are independently anchored and evenly distributed across the 3M brush surface, making the 3M brush ideal for removing pad debris from soft microreplicated, porometric and felt-based CMP pads. Bristles are made from an exclusive polymer that resists corrosion much better than metal. The polycarbonate carrier features a universal mounting configuration, making for easy connection to a wide range of polishing tools and effectors.

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