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3M™ Diamond Pad Conditioner Ring is a highly engineered pad conditioner designed to deliver reliable performance for critical semiconductor CMP applications. Utilizes Sintered Abrasive Technology for excellent diamond retention, with controlled diamond placement and protrusion.
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Current product 3M™ Diamond Pad Conditioner Ring | ||
|---|---|---|
| Carrier Diameter (Metric) | 260 mm, 360 mm | |
| CMP Process | PMD/ILD, W (Bulk), Cu (Bulk) | |
| Carrier Diameter (Imperial) | 10.236 in, 14.173 in | |
| Diamond Size | 181 micron, 250 micron, 251 micron |