Highly engineered pad conditioners deliver reliable performance for critical semiconductor CMP applications. Utilizes Sintered Abrasive Technology for excellent diamond retention, with controlled diamond placement and protrusion.
Current product 3M™ Diamond Pad Conditioner Ring E221, 260 mm diameter | ||
|---|---|---|
| Carrier Diameter (Metric) | 260 mm | |
| CMP Process | PMD/ILD | |
| Carrier Diameter (Imperial) | 10.236 in | |
| Diamond Size | 251 micron |