3M™ 11B Enriched Boron Trifluoride is an isotopically enriched material used for silicon doping. It is produced to have >99.9% purity and >99.8% 11B enrichment. Additionally, this product contains 25% more boron-11 than naturally occurring materials, making it well suited for semiconductor manufacturing, including solar applications.
3M™ 11B Enriched Boron Trifluoride (11BF3) is an isotopically enriched material used for silicon doping. It is produced to have more than 99.9% purity and 99.8% 11B enrichment. 3M 11B enriched boron trifluoride contains 25% more boron-11 than naturally occurring materials. Additionally, this product is used in the ion implantation process as the most commercially preferred p-dopant for silicon.
A Leading Producer of Enriched Boron
Importantly, this quality product is created and backed by 3M – a leading global commercial processor of enriched boron. We create this product, and others, at one of the largest boron isotope enrichment facilities in the world. Notably, we focus on manufacturing optimized materials with an emphasis on stable boron isotopes. Our proprietary manufacturing process allows formulations to exceed 99% 11B enrichment. We offer a proven supply chain and have decades of experience supplying material to the industry. Additionally, we provide our customers with consistent product quality and the ability to custom engineer products for your unique applications. Our specialists are experts at solving materials-related problems in the demanding semiconductor industries. Work with our 3M technical experts to determine the best ultra-high purity boron for your needs.
Applications and Industries