Betapure™ CMP filter cartridges are high capacity depth filters optimized for oxide and metal slurries used in chemical mechanical planarization (CMP) applications. Betapure CMP filters are composed of all-polypropylene components and features a multi-zone "graded-porosity" design for the optimum level of particle classification.
The Graded Porosity Advantage
The Betapure CMP Series Filter Cartridge offers a graded-density, or "graded porosity," media that removes particles in sequential size — starting with the larger particles and ending finally with the smallest ones. The outer layers of the media act as a pre-filter while the innermost sections offer precise removal of tiny particulate.
By spreading the filtration throughout the depths of the media, the Betapure CMP Series FIlter Cartridge makes effective use of the media, extending the filter's service life and saving the user money with fewer change-outs. The graded porosity design provides superior removal of hard and soft gel contaminants — reducing defects and improving yields. The high contaminant holding capacity also reduces downtime and increases overall equipment effectiveness.
Discover More about CMP Series FIlter Cartridges (PDF, 4.49 Mb)
Superior Reduction of Large Particle Counts
While effectively removing particulate of varying sizes, the Betapure CMP Series Filter Cartridge also offers superior slurry classification. This is important because an effective slurry filter is designed to let particles of a specific size pass through unchanged while removing only the undesirable particles within a certain range.
Toward that end, this filter cartridge also reduces large particle counts (LPC). LPC's tend to accumulate over time when existing particles aggregate or gel. This undesirable process is fairly common during adverse shipping conditions, shearing, slurry drying, and interaction with other distribution loop components such as fittings tanks, piping, valves and pumps. If left unaddressed, LPC's can scratch metal and inter-level dielectrics potentially causing wafer defects.
The Betapure CMP Series Filter Cartridge effectively reduces LPC's that can cause equipment damage and potentially reduce yields while maintaining the polishing characteristics of the slurry. The 100% polypropylene materials offer broad temperature and chemical compatibility, which provides durability throughout demanding process applications.
Learn More about Slurry Distribution Systems (PDF, 3.53 Mb)
Quality Control and Product Support
3M is committed to ensuring that products consistently perform well. That's why it integrates a quality control system into its work. The Betapure CMP Series Filter Cartridge is built to exacting specifications that provide a consistent quality of slurry enabling repeatability of the planarization process. 3M product is manufactured using a quality assurance program certified under ISO. Every cartridge is identified with a unique lot number, which allows for total product and components traceability. Every cartridge is manufactured and double-bagged in a clean environment to provide superior downstream cleanliness out of the package.
Recommended Applications:
Semiconductor
- Oxide/Low-k dielectrics
- Shallow Trench Isolation (STI)
- Inter-level Dielectric (ILD)
- Polysilicon
- Tungsten and copper
Data Storage
- Magnetic heads
- Nickel and glass substrates
Data Transmission
Compound Semiconductor
- Light Emitting Diodes (LED)
