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3M™ CMP Pad Conditioner Brush PB32A-1, 4.25-in dia

Part Number PB32A3M ID 60020020792UPC 00051111900925
  • Exclusive polymer substrate enhances corrosion resistance
  • Durable brush bristles assist with removal of pad debris from porometric and felt-based pads
  • Easy connection to polishing tool end effector
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Specifications
Attribute Name
Value
Abrasive Material
Nylon Fibers
Abrasive Working Surface
Full Face
Application
CMP
Brand
3M™
Bristle Diameter
0.005 in
Brush Material-Density
Nylon, >2000/sq in
Carrier Color
Black
Carrier Format
Disk
Carrier Material
Polycarbonate
Carrier Size
4.25 inch diameter
Carrier Substrate
Polycarbonate
CMP Process
Cu (barrier), Final Buff, W (buff)
Manufacturing Location
United States
Product Series
PB32A
Product Type
Pad Conditioner Brush
TDS Required
No
Product Details
  • Exclusive polymer substrate enhances corrosion resistance
  • Durable brush bristles assist with removal of pad debris from porometric and felt-based pads
  • Easy connection to polishing tool end effector

Engineered CMP pad brushes are designed for critical semiconductor buff CMP applications.

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Product Disclaimer
  • Use of pad conditioners in process is pad dependent. Additional processes may be supported, contact 3M lab to verify product recommendations
  • The technical information and data shown on this page should be considered representative or typical only and should not be used for specification purposes
  • 3M products shown on this website may not be available in all geographic regions or may not be available at this time. Please contact your local sales representative to determine product availability.

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